Patent
1979-04-02
1980-04-08
Hix, L. T.
354300, 354317, 354324, 34219, G03D 700
Patent
active
041969995
ABSTRACT:
Film patterns are duplicated onto diazo-material in a developing apparatus which has a circulatory flow circuit with a pump for the developer ammonia gas to circulate the latter in sequential steps between a developing chamber and an ammonia gas supply container. Magnetic control valves open and close other valves in the closed circuit and in access circuits to make sure that the developing takes place in said sequence. The access circuits include an auxiliary gas container, a further pump and a vacuum container as well as further controlling and controlled valves for the sequence control.
REFERENCES:
patent: 1904551 (1933-04-01), Smith
patent: 3323436 (1967-06-01), Hafer et al.
patent: 3748995 (1973-07-01), Schroter et al.
patent: 4048645 (1977-09-01), Reams
patent: 4121236 (1978-10-01), Welp et al.
Sahlmann Jurgen
Welp Ulrich
Fasse W. G.
Gould D. F.
Hix L. T,.
Mathews Alan
Microbox Dr. Welp GmbH & Co.
LandOfFree
Developing apparatus for duplicating of film patterns on diazo-m does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Developing apparatus for duplicating of film patterns on diazo-m, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Developing apparatus for duplicating of film patterns on diazo-m will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-971213