Developing apparatus, developing method and substrate processing

Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

396627, G03D 500

Patent

active

060897627

ABSTRACT:
The present invention provides a developing apparatus and a developing method which make it possible to uniformly develop a photosensitive film which is formed on a substrate at a high throughput. A substrate processing apparatus which comprises such a developing apparatus and a developing method is also realized. During developing processing, a substrate is held still by a substrate holding portion. A developing solution dispensing nozzle moves over the substrate, linearly from a position off and on one side of the substrate to a position off and on the other side of the substrate in a scanning direction (A), and supplies a developing solution onto the substrate. After the developing solution dispensing nozzle moves in the scanning direction (A), a substrate transport apparatus replaces the substrate which is held by the substrate holding portion with another substrate. Following this, the developing solution dispensing nozzle moves over the substrate, linearly from the position off and on the other side of the substrate to the position off and on the one side of the substrate in an opposite scanning direction (D) to the scanning direction (A), and supplies the developing solution onto the substrate.

REFERENCES:
patent: 5252137 (1993-10-01), Tateyama et al.
patent: 5489337 (1996-02-01), Nomura et al.
patent: 5871584 (1999-02-01), Tateyama et al.
patent: 5984540 (1999-11-01), Minasaka et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Developing apparatus, developing method and substrate processing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Developing apparatus, developing method and substrate processing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Developing apparatus, developing method and substrate processing will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2029954

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.