Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to attribute – absence or presence of work
Reexamination Certificate
2005-08-11
2010-10-05
Koch, III, George R (Department: 1791)
Coating apparatus
Control means responsive to a randomly occurring sensed...
Responsive to attribute, absence or presence of work
C118S686000
Reexamination Certificate
active
07806076
ABSTRACT:
A developing apparatus for developing a substrate whose surface is coated with a coating solution and then exposed includes a substrate supporting unit for horizontally supporting the substrate, a rotation driving mechanism for rotating the substrate supporting unit forwardly or backwardly with respect to a vertical axis, a developer nozzle, disposed to face a surface of the substrate supported by the substrate supporting unit, having a strip-shaped injection opening extended along a direction extending from a periphery of the substrate toward a central portion thereof, a moving unit for moving the developer nozzle from an outer portion of the substrate toward the central portion thereof, and a controller for controlling operations such that while the substrate is rotated forwardly by the rotation driving mechanism, a developer is supplied through the injection opening to the surface of the substrate by moving the developer nozzle and, then, the substrate is rotated backwardly by the rotation driving mechanism.
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Korean Office Action dated Jun. 24, 2010, in Application No. 10-2005-0076034, 5 pages.
Ookouchi Atsushi
Takeguchi Hirofumi
Yamamoto Taro
Yoshihara Kousuke
Koch, III George R
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
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