Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium
Reexamination Certificate
2005-03-22
2005-03-22
Rutledge, D. (Department: 2851)
Photography
Fluid-treating apparatus
Fluid application to one side only of photographic medium
C396S611000, C396S627000, C118S052000, C427S240000
Reexamination Certificate
active
06869234
ABSTRACT:
A substrate (SW) is rotatably held in an approximately horizontal position by a wafer holding and rotation mechanism (810). One end of a rinsing liquid supply nozzle (840) is rotatably supported by a rinsing liquid supply nozzle rotation supporting mechanism (850) to pass over the substrate (SW). In response to rotation of the rinsing liquid supply nozzle (840), the rotation axis of the rinsing liquid supply nozzle (840) moves in a direction closer to or away from the rotation axis of the substrate (SW), whereby the amount of projection of a tip portion of the rinsing liquid supply nozzle (840) is reduced.
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patent: 6183810 (2001-02-01), Ota
patent: 6270579 (2001-08-01), Subramanian et al.
patent: 10-020508 (1998-01-01), None
patent: 10-340836 (1998-12-01), None
patent: 11-267573 (1999-10-01), None
patent: 3352417 (2002-09-01), None
Harumoto Masahiko
Kobayashi Hiroshi
Matsunaga Minobu
Morita Akihiko
Sanada Masakazu
Dainippon Screen Mfg. Co,. Ltd.
Ostrolenk Faber Gerb & Soffen, LLP
Rutledge D.
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