Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium
Reexamination Certificate
2011-04-12
2011-04-12
LaBalle, Clayton E (Department: 2862)
Photography
Fluid-treating apparatus
Fluid application to one side only of photographic medium
C396S564000, C396S582000
Reexamination Certificate
active
07922405
ABSTRACT:
A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects.
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Machine translation of JP 07-135137A.
Office Action dated May 8, 2009 issued in corresponding Chinese Patent Application No. 200710006223.9.
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Mitsuhashi Tsuyoshi
Sugimoto Kenji
Dainippon Screen Mfg. Co,. Ltd.
LaBalle Clayton E
Ostrolenk Faber LLP
Smith Linda B
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