Coating apparatus – With means to apply electrical and/or radiant energy to work... – With means to orient coating particles
Patent
1988-12-28
1990-04-03
Moses, R. L.
Coating apparatus
With means to apply electrical and/or radiant energy to work...
With means to orient coating particles
355265, 355246, 355261, 355256, 118662, G03G 1510
Patent
active
049130862
ABSTRACT:
A developing apparatus for bringing a film into contact with a frame portion which defines a developing chamber in such a manner that a surface of the film formed an electrostatic latent image is opposed to a developing electrode disposed in the developing chamber, and for developing the film under a liquid developer supplied to the developing chamber while applying a bias voltage to the developing electrode. The developing apparatus interrupts the application of the bias voltage to the developing electrode at the time of the contact. Consequently, discharge between the film and the developing electrode can be prevented at the time of the contact.
REFERENCES:
patent: 3820890 (1974-06-01), Kuehnle
patent: 3936854 (1976-02-01), Smith
patent: 3964436 (1976-06-01), Plumadore
patent: 3964828 (1976-06-01), Yamada et al.
patent: 4006986 (1977-02-01), Kuehnle
patent: 4141647 (1979-02-01), Lempke et al.
patent: 4160593 (1979-07-01), Rosenburgh
patent: 4435071 (1984-03-01), Kuehnle
patent: 4595276 (1986-06-01), Plumadore
patent: 4600291 (1986-07-01), Ohtsuka et al.
patent: 4613226 (1986-09-01), Kimura et al.
patent: 4622915 (1986-11-01), Ohtsuka et al.
patent: 4623240 (1986-11-01), Kimura et al.
patent: 4727393 (1988-02-01), Ohtsuka et al.
patent: 4760425 (1988-07-01), Okano et al.
patent: 4797644 (1989-01-01), Takahashi
patent: 4809642 (1989-03-01), Kimura et al.
Sato Yoshimitsu
Yoda Akira
Fuji Photo Film Co. , Ltd.
Moses R. L.
LandOfFree
Developing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Developing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Developing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1350019