Developer endpoint detection in a track lithography system

Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium

Reexamination Certificate

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Details

C396S569000, C396S578000, C430S030000

Reexamination Certificate

active

07371022

ABSTRACT:
A method of detecting developer endpoint. The method includes illuminating a device region of a substrate with a first optical beam prior to initiating a development stage of processing and detecting a baseline optical signal reflected from the device region of the substrate. The method also includes illuminating the device region of the substrate with a second optical beam during a development stage of processing and detecting an endpoint optical signal reflected from the device region of the substrate. The method further includes comparing the baseline optical signal to the endpoint optical signal and determining a developer endpoint based on the comparing step.

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patent: 2003/0197848 (2003-10-01), Shiraishi
patent: 2004/0043310 (2004-03-01), Takeishi et al.

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