Developer compositions

Details Developer compositions Developer compositions

1985-03-20

1987-01-06

Welsh, John D.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Post imaging process, finishing, or perfecting composition...

G03G 910

Patent

active

046346490

ABSTRACT:
Disclosed is a two-component developer composition enabling smudge resistant images which is comprised of improved two-component contamination free developer composition comprised of (1) magnetite; (2) a polyester resin comprised of the polymeric esterification product of a dicarboxylic acid and a diol comprising a diphenol of the following formula ##STR1## wherein R is selected from substituted and unsubstituted alkylene radicals of from about 2 to about 12 carbon atoms, alkylidene radicals of from 1 to 12 carbon atoms and cycloalkylidene radicals of from 3 to 12 carbon atoms; R' and R" are selected from substituted and unsubstituted alkylene radicals of from 2 to 12 carbon atoms, alkylene arylene radicals of from 8 to 12 carbon atoms and arylene radicals; X and X' are selected from hydrogen or any alkyl radical having from 1 to 4 carbon atoms; and each n is a number of from 0 (zero) to 4; and (3) carrier particles.

REFERENCES:
patent: 3239465 (1958-03-01), Rheinfrank
patent: 3558492 (1971-01-01), Proskow
patent: 3645770 (1972-02-01), Flint
patent: 3655374 (1972-04-01), Palermiti et al.
patent: 4082681 (1978-04-01), Takayama et al.

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