Determining the presence of defects in thin film structures

Details Determining the presence of defects in thin film structures Determining the presence of defects in thin film structures

1997-07-31

1999-11-09

Rosenberger, Richard A.

Optics: measuring and testing

Inspection of flaws or impurities

73643, G01N 2904

Patent

active

059824824

ABSTRACT:
The invention features a method for detecting a subsurface defect in a thin film structure. The method includes: optically generating an acoustic wave in a first spatial region of the film; optically measuring a time-dependent reflection of the acoustic wave from subsurface features in the film to produce a time-dependent signal; and analyzing the signal to detect an existence of the defect. The optically measuring step can include measuring the diffraction of a probe beam from the reflected acoustic wave. The analyzing step can include comparing the measured signal to a reference signal for defect-free structure.

REFERENCES:
patent: 4541280 (1985-09-01), Cielo et al.
patent: 4581939 (1986-04-01), Takahashi
patent: 4710030 (1987-12-01), Tauc et al.
patent: 5344236 (1994-09-01), Fishman
patent: 5672830 (1997-09-01), Rogers et al.
Rogers, "In-Plane Acoustic Echoes," Time-Resolved Photoacoustic and Photothermal Measurements on Surfaces, Thin Films and Multilayer Assemblies, May 1995, pp. 36-40.

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