Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Quality evaluation
Reexamination Certificate
2007-08-28
2010-06-01
Le, John H (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Quality evaluation
C356S625000
Reexamination Certificate
active
07729873
ABSTRACT:
Provided is a method for determining one or more profile parameters of a structure using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signals is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters and used to generate a library of difference diffraction signals. A measured diffraction signal adjusted by the simulated approximation diffraction signal is matched against the library to determine at least one profile parameter of the structure.
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Moon, et al., “Fitting-based Determination of an Effective Medium of Metallic Periodic Structure and Application to Photonic Crystals”, vol. 23, No. 1, Jan. 2006, J. Opt. Soc. of America.
Li Shifang
Liu Wei
Yang Weidung
Le John H
Madriaga Manuel B.
Tokyo Electron Limited
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