Determining profile parameters of a structure using...

Data processing: measuring – calibrating – or testing – Measurement system – Dimensional determination

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07949490

ABSTRACT:
Provided is a method for determining one or more profile parameters of a structure using an optical metrology model, the optical metrology model including a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signals is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A measured diffraction signal adjusted by the simulated approximation diffraction signal is input into the trained machine learning system and generates the corresponding profile parameters.

REFERENCES:
patent: 6891626 (2005-05-01), Niu et al.
patent: 6943900 (2005-09-01), Jakatdar et al.
patent: 2004/0017574 (2004-01-01), Vuong et al.
patent: 2004/0267397 (2004-12-01), Doddi et al.
patent: 2006/0290947 (2006-12-01), Li et al.
patent: 2007/0135959 (2007-06-01), Voung et al.
patent: 2009/0063077 (2009-03-01), Liu et al.
Choy, “Effective Medium Theory: Principles and Applications”, Oxford University Press, 1999.
Moon, et al., “Fitting-based Determination of an Effective Medium of Metallic Periodic Structure and Application to Photonic Crystals”, vol. 23 No. 1, Jan. 2006, J, Opt. Soc. of America.
U.S. Appl. No. 11/846,462, filed Aug. 28, 2007 for Liu, et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Determining profile parameters of a structure using... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Determining profile parameters of a structure using..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Determining profile parameters of a structure using... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2689095

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.