Determining layer thickness using photoelectron spectroscopy

Details Determining layer thickness using photoelectron spectroscopy Determining layer thickness using photoelectron spectroscopy

2005-04-29

2008-09-02

Berman, Jack I. (Department: 2881)

Radiant energy

Electron energy analysis

C250S306000, C250S307000, C250S310000, C324S702000, C324S716000, C324S754120, C378S045000, C378S050000

Reexamination Certificate

active

07420163

ABSTRACT:
According to one embodiment of the invention, photoelectron spectroscopy is used to determine the thickness of one or more layers in a single or multi-layer structure on a substrate. The thickness may be determined by measuring the intensities of two photoelectron species or other atom-specific characteristic electron species emitted by the structure when bombarded with photons. A predictive intensity function that is dependent on the thickness of a layer is determined for each photoelectron species. A ratio of two predictive intensity functions is formulated, and the ratio is iterated to determine the thickness of a layer of the structure. According to one embodiment, two photoelectron species may be measured from a single layer to determine a thickness of that layer. According to another embodiment, two photoelectron species from different layers or from a substrate may be measured to determine a thickness of a layer.

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