Compositions – Fluent dielectric – N-containing
Patent
1986-09-15
1988-11-08
Lieberman, Paul
Compositions
Fluent dielectric
N-containing
252 891, 25217418, 25217421, 252544, 252548, C11D 110, C11D 183
Patent
active
047832827
ABSTRACT:
The invention relates to a process for the preparation of a detergent containing one or more compounds having the formula RCONH(C.sub.2 H.sub.4 O).sub.n CH.sub.2 COOH, salts and glycerol, ethoxylated glycerol, carboxymethylated glycerol, or carboxymethyl ethoxylated glycerol and mixture thereof, where R represents a linear or branched aliphatic hydrocarbon group with 5-21 carbon atoms and n is a number from 1-20, by amidating, ethoxylating and carboxymethylating one or more fatty acids having the formula RCOOH and, if so desired, converting all or part of the ether carboxylic acid obtained to a salt thereof, characterized in that an oil or fat is started from and that this oil or fat is aminolyzed in the presence of an alkali(ne earth) metal and the reaction mixture obtained is in the usual manner ethoxylated, carboxymethylated and, if desired, converted in whole or in part to a salt.
REFERENCES:
patent: 2151788 (1939-03-01), Mauersberger
patent: 4307079 (1981-12-01), Zorayan et al.
Hydrolysis of Fats, Saponification, Soap, Organic Chemistry, 2nd Edition, Robert T. Morrison and Robert N. Boyd, pp. 685-686, 1966.
Polyoxyethylene Esters of Fatty Acids, Nonionic Surfactants, Martin T. Schick, pp. 142-146, Marcel Dekker, Inc., New York, 1967.
European Search Report EP 86 20 1588 dated Oct. 12, 1986.
Le Hoa Van
Lieberman Paul
Stamicarbon B.V.
LandOfFree
Detergents containing polyether carboxylic acid derivatives, the does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Detergents containing polyether carboxylic acid derivatives, the, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Detergents containing polyether carboxylic acid derivatives, the will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-462910