Detergent injection systems and methods for carbon dioxide...

Cleaning and liquid contact with solids – Apparatus – With heating – cooling or heat exchange means

Reexamination Certificate

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C134S108000, C134S094100, C134S100100

Reexamination Certificate

active

07044143

ABSTRACT:
Microelectronic substrate processing systems include a microelectronic substrate processing chamber that is configured to contain therein at least one microelectronic substrate. A carbon dioxide supply system is configured to supply densified carbon dioxide to the microelectronic substrate processing chamber. A detergent supply system is configured to supply detergent to the microelectronic substrate processing chamber.

REFERENCES:
patent: 3653234 (1971-04-01), Gillespie
patent: 5213619 (1993-05-01), Jackson et al.
patent: 5267455 (1993-12-01), Dewees et al.
patent: 5344493 (1994-09-01), Jackson
patent: 5412958 (1995-05-01), Iliff et al.
patent: 5467492 (1995-11-01), Chao et al.
patent: 5669251 (1997-09-01), Townsend et al.
patent: 5683977 (1997-11-01), Jureller et al.
patent: 5759209 (1998-06-01), Adler et al.
patent: 5772783 (1998-06-01), Stucker
patent: 5772784 (1998-06-01), Mohindra et al.
patent: 5784905 (1998-07-01), Townsend et al.
patent: 5789505 (1998-08-01), Wilkinson et al.
patent: 5822818 (1998-10-01), Chao et al.
patent: 5868856 (1999-02-01), Douglas et al.
patent: 5881577 (1999-03-01), Sauer et al.
patent: 5904737 (1999-05-01), Preston et al.
patent: 5943721 (1999-08-01), Lerette et al.
patent: 5953780 (1999-09-01), Schollmeyer et al.
patent: 5970554 (1999-10-01), Shore et al.
patent: 5976264 (1999-11-01), McCullough et al.
patent: 6045588 (2000-04-01), Estes et al.
patent: 6073292 (2000-06-01), Lindqvist et al.
patent: 6092538 (2000-07-01), Arai et al.
patent: 6129451 (2000-10-01), Rosio et al.
patent: 6240936 (2001-06-01), DeSimone et al.
patent: 6306564 (2001-10-01), Mullee
patent: 6442980 (2002-09-01), Preston et al.
patent: 6461387 (2002-10-01), Jureller et al.
patent: 6481247 (2002-11-01), Fedegari
patent: 6499322 (2002-12-01), DeYoung et al.
patent: 6576066 (2003-06-01), Namatsu
patent: 6612317 (2003-09-01), Costantini et al.
patent: 6737225 (2004-05-01), Miller
patent: 6764552 (2004-07-01), Joyce et al.
patent: 6802961 (2004-10-01), Jackson
patent: 6821356 (2004-11-01), Wandke et al.
patent: WO 97/33031 (1997-09-01), None
patent: WO99/10587 (1999-03-01), None
patent: WO99/34937 (1999-07-01), None
patent: WO 99/49122 (1999-09-01), None
International Search Report dated Sep. 11, 2000; International Application No. PCT/US00/13103.
Shaffer II et al.,On the Mechanical Integrity of Ultra-Low Dielectric Constant Materials for Use in BEOL Structures, Advanced Electronics Materials, MRS Spring 2000, Apr. 25, 2000, pp. 1-24.

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