Detection of contamination in imaging systems by...

Radiant energy – Luminophor irradiation – With ultraviolet source

Reexamination Certificate

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Reexamination Certificate

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07087907

ABSTRACT:
Process and system for detection of contamination in an imaging system, including providing an imaging system having one or more element having a surface for reflecting or refracting first incident radiation; mounting with respect to at least one of the one or more element one or more detector capable of sensing third radiation emitted or transmitted by one or more contaminant on the surface of the one or more element when second radiation is absorbed by the one or more contaminant; applying the first incident radiation and/or the second radiation to the at least one element; and detecting with the one or more detector the third radiation emitted or transmitted by the one or more contaminant.

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“Assessment of Beamline Photo-Induced Contamination for 157 nm Lithography”; International SEMATECH; Technology Transfer #0211433A-ENG, (Nov. 2002).
Meute et al.; “Contamination and Degradation of 157 nm Stepper Optical Components—Field Experience at International SEMATECH”; Proc. SPIE, vol. 4691, p. 724-733 (Jul. 2002).
Keller, AA, ML Kram. Use of Laser Induced Fluorescence to Detect DNAPL and Fluorophore Mixtures In-Situ. Proceedings of the XXVIII IAHR Congress, Graz, Austria (1999).

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