Chemistry: analytical and immunological testing – Measurement of electrical or magnetic property or thermal... – By means of a solid body in contact with a fluid
Reexamination Certificate
2005-08-09
2005-08-09
Gakh, Yelena G. (Department: 1743)
Chemistry: analytical and immunological testing
Measurement of electrical or magnetic property or thermal...
By means of a solid body in contact with a fluid
C436S149000, C422S098000
Reexamination Certificate
active
06927067
ABSTRACT:
Sensor arrays, methods, and systems for detecting the presence of gas phase materials by the formation of films based on the gas phase material are disclosed. The gas phase materials preferentially deposit conductive films on receptor materials that can be detected. The invention may also provide for increased sensitivity to the deposition of conductive materials through the use of closely spaced conductive electrodes interconnected by lines of receptor material. Examples of gas phase materials that may be detected include RuO4, IrO4and RhO4.
REFERENCES:
patent: 3585073 (1971-06-01), Veenstra et al.
patent: 3714562 (1973-01-01), McNerney
patent: 3890703 (1975-06-01), Frazce et al.
patent: 4433320 (1984-02-01), Murata et al.
patent: 4442422 (1984-04-01), Murata et al.
patent: 4677416 (1987-06-01), Nishimoto et al.
patent: 4911892 (1990-03-01), Grace et al.
patent: 5147737 (1992-09-01), Post et al.
patent: 5331287 (1994-07-01), Yamagishi et al.
patent: 5337018 (1994-08-01), Yamagishi
patent: 5653807 (1997-08-01), Crumbaker
patent: 5756879 (1998-05-01), Yamagishi et al.
patent: 5857250 (1999-01-01), Riley et al.
patent: 5906726 (1999-05-01), Schneider et al.
patent: 6280604 (2001-08-01), Allen et al.
patent: 6436246 (2002-08-01), Sandhu
patent: 6479297 (2002-11-01), Sandhu
patent: 6689321 (2004-02-01), Sandhu
patent: 2003/0138958 (2003-07-01), Blalock
patent: 386660 (1990-09-01), None
patent: 1576658 (1969-08-01), None
patent: 1151482 (1969-05-01), None
patent: 2048471 (1980-12-01), None
patent: 60-210752 (1985-10-01), None
patent: 2-69658 (1990-03-01), None
patent: 2-293644 (1990-12-01), None
patent: 3-48748 (1991-03-01), None
Akinfieva, T.A., “Basis for the maximum allowable concentration of ruthenium dioxide in the air of work areas,”Gigiena Truda i Professional'nye Zabolevaniya, 1981:46-47 (English Abstract Included).
Crawford et al., “Use of the Hazop Analysis for Evaluation of CVD reactors,”Journal de Physique IV, Sep. 1991: C2-459—C2-466.
Gale et al., “Interaction of Safety and the facility for Photovoltaic R & D,”American Institute of Physics Conference Proceedings, 1988;66:145-151.
Koda et al., “Radioactivation determination of ruthenium,”Kyoto Daigaku Genshiro Jikkensho Gakujutsu Koenkai Koen Yoshishyu, 1976;10:25-27. (English Translation).
Lu et al., “Epitaxial growth of RuO2thin films by metal-organic chemical vapor deposition,”Thin Solid Films, 1999;340:140-144.
Orlow et al., “Detection of Ruthenium in Platinum Alloys,”Chemiker-Zeitung, 1908;32:77. (English Translation).
Aizenshtein et al., “Method of measurement of the rate of deposition of pure metals from the gas phase,”Chem. Abstr., 1966; 64:abstract 1747e.
Aizenshtein et al., “Method of Measuring Rate of Pure Metals Deposition from the gas phase,”Tsvetnye Metally The Soviet Journal of Non-Ferrous Metals, 6(9): 72-74.
Bardin et al., “Voltametry of Ruthenate, Determination of Ruthenium from the Electrochemical Reduction of Ruthenium,”Journal of Analytical Chemistry of the USSR, 1975;30: 642-645.
Bates, J.R. et al., “The influence of the electrodeposition parameters on the morphology of organo-transition metal complexes for thin film gas sensor application”,Thin Solid Films, 1997;299: 18-24.
Brown et al., “New method for the characterization of domain morphology of polymer blends using ruthenium tetroxide staining and low voltage scanning electron microscopy (LVSEM),”Polymer, 1997; 38(15): 3937-3945.
Kawahara et al., “(Ba,Sr)TiO3Films Prepared by Liquid Source Chemical Vapor Deposition on Ru Electrodes,”Jpn Journ Appl Phys, 1996;35 (Part 1, No. 9B): 4880-4885.
Kawahara et al., “(Ba, Sr)TiO3Films Prepared by Liquid Source Chemical Vapor Deposition on Ru Electrodes,”J. Appl. Phys., 1996;35: 4880-4885.
Koda et al., “Radioactivation determination of ruthenium,”Chem Abstr, 1979;90: abstract 114382q.
Koda et al., “Radioactivation determination of ruthenium,”Kyoto Daigaku Genshiro Jikkensho Gakujutsu Koenkai Koen Yoshishu, 1976;10: 25-27.
Kolesov et al., “Role of surface moisture of samples in the determination of volume resistivity of polymers,”Chem Abstr, 1989; 110: abstract 213848j.
Li et al., “RuO4Staining and Lamellar Structure of α-and β-PP,”J. Appl. Polym. Sci., 1999; 72:1529-1538.
Miyashita, Haruzo, “Particle Measurement in Vacuum Tools by In Situ Particle Monitor,”Aneruba Giho, 1996; 2: 67-71.
Morgunov et al., “Evaluation of the film structure imperfections from electric conductivity by the statistical analysis of data,”Chem Abstr, 1982; 96: abstract 105113z.
Ohlsson et al., “The Use of RuO4in Studies of Polymer Blends by Scanning Electron Microscopy,”J Appl. Polym. Sci., 1990; 41: 1189-1196.
Orlow, N.A., “Uber de Nachweis von Ruthenium in den Platinlegierungen,”Chemiker-Zeitung, 1908; 32: 77.
Orlow, “Detection of Ruthenium in Platinum Alloys,”Arch. Experiment. Pathol.;43: 131.(with translation).
Provo, J.L., “Film-thickness resistance monitor for dynamic control of vaccum-deposited films,”J. Vac. Sci. Technol., Jul./Aug. 1975; 12(4): 946-952.
Sano et al., “Lamellar morphologies of melt-crystallized polyethylene, isotactic polypropylene and ethylene-propylene copolymers by the RuO4staining technique,”Polymer, Oct. 1986; 27: 1497-1504.
Setz et al., “Morphology and Mechanical Properties of Blends of Isotactic or Syndiotactic Polypropylene with SEBS Block Copolymers,”J. Appl. Poly. Sci., 1996; 59: 1117-1128.
Shabasy et al., “Electrical properties of thin metal zinc films,”Journal of Material Science, 1990;25: 585-588.
Schepis et al., “Influence of deposition rates and thickness on the electrical resistivity and thermoelectric power of thin iron films,”Thin Solid Films, 1994;251: 99-102.
Takayama et al., “Gas-Sensitive Ag Ion Conduction in Semiconducting ZnO Thin Films,”Solid State Ionics, 1989; 35: 411-415.
Tardif et al., “Monitoring of metallic contamination by direct and indirect analytical methods application to cleaning processes in IC manufacturing,”Chem Abstr., 1995;123: abstract 328642y.
Trent et al., “Ruthenium Tetraoxide Staining of Polymers for Electron Microscopy,”Macromolecules, 1983; 16: 589-598.
Tvaro{hacek over (z)}ek et al., “Thin-film microsystem applicable in (bio)chemical sensors,”Sensors and Actuators, 1994; 18-19: 597-602.
Tyutnev et al., “Concerining the Radiation-Induced Surface Conductivity in Polymers,”Phys. Status Solidii A, 1984;86: 709-716.
Watari et al., “Present status of volatile ruthenium in analytical chemistry and health physics,”Chem Abstr, 1987;106:abstract 91861c.
Watari et al.,Nihon Genshiryoku Gakkaishi, 1986;28: 493-500.
Watari et al., “Present Status of volatile ruthenium in analytical chemistry and health physics,”Nihon Genshiryoku Gakkaishi, 1986;28(6): 15-22. (with translation).
Yuan et al., “Low-Temperature Chemical Vapor Deposition of Ruthenium Dioxide from Ruthenium Tetroxide: A Simple Approach to High Purity RuO2Films,”Chem Mater, 1993; 5: 908-910.
Gakh Yelena G.
Mueting Raasch & Gebhardt, P.A.
LandOfFree
Detection devices, methods and systems for gas phase materials does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Detection devices, methods and systems for gas phase materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Detection devices, methods and systems for gas phase materials will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3442313