Optics: measuring and testing – Inspection of flaws or impurities
Reexamination Certificate
2011-08-02
2011-08-02
Stafira, Michael P (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Reexamination Certificate
active
07990529
ABSTRACT:
In a foreign matter inspection apparatus for a semiconductor wafer, a PMT which detects reflection light, an amplifier which amplifies a signal detected by the PMT and in which response characteristics of amplification are controlled by a control signal, an A/D converter which converts the signal amplified by the amplifier into a predetermined code and outputs the code, a control circuit which generates a control signal based on information of the semiconductor wafer having a correlation with the reflection light, and a data processing circuit which detects a foreign matter on the semiconductor wafer based on the code output from the A/D converter are provided.
REFERENCES:
patent: 3907440 (1975-09-01), Eichenberger et al.
patent: 5313169 (1994-05-01), Fouche et al.
patent: 6191849 (2001-02-01), Maeshima et al.
patent: 6509966 (2003-01-01), Ishiguro
patent: 7602482 (2009-10-01), Matsui
patent: 2004/0124832 (2004-07-01), Makuuchi et al.
patent: 08-145899 (1996-06-01), None
Jingu Takahiro
Makuuchi Masami
Orihashi Ritsuro
Akanbi Isiaka O
Antonelli, Terry Stout & Kraus, LLP.
Hitachi High-Technologies Corporation
Stafira Michael P
LandOfFree
Detection circuit and foreign matter inspection apparatus... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Detection circuit and foreign matter inspection apparatus..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Detection circuit and foreign matter inspection apparatus... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2724881