Detection and monitoring of toxic halogenated compounds

Chemistry: analytical and immunological testing – Halogen containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

436125, 436126, 436161, 436173, 436 85, 250281, 250282, 250288, G01N 3300

Patent

active

060603259

ABSTRACT:
The present invention is directed to a method for determining the halogen toxicity level in a sample containing halogenated compounds, specifically halogen containing rubbers by utilizing thermal electrons formed inside a mass spectrometer operated at negative ion electron capture conditions. The method allows for detection of the toxic species from the parts per million level, down to the parts per billion levels. The method comprises the steps of (a) ionizing a reagent gas capable of producing thermal electrons having a thermal energy of 0 to 10 eV with the a polychromatic ion source of a mass spectrometer to produce thermal electrons having thermal energy of 0 to 10 eV, (b) capturing said thermal electrons with a halogen containing compound to form halogen atomic anions or halogen atomic cluster anions wherein said halogen containing compound has been passed through a gas chromatograph prior to said capturing of thermal electrons and wherein a mass spectrogram is obtained following said capturing of electrons, (c) speciating and quantifying said halogen atomic anions or halogen atomic cluster anions using a mass chromatogram produced from a combination of said gas chromatography and said mass spectrometer.

REFERENCES:
patent: 5493115 (1996-02-01), Deinzer et al.
I. K. Mun et al. Anal. Chem. 1977, 49, 1723-1726.
R. J. Anderegg Anal. Chem. 1981, 53, 2169-2171.
N. Gj.o slashed.s et al, Anal. Chem. 1982, 54, 1316-1318.
J. L. LaBrosse et al. J. Chromatog. 1984, 314, 93-102.
D. R. Scott Anal. Chem. 1986, 58, 881-890.
H.-R. Buser Anal. Chem. 1986, 58, 2913-2919.
M. A. Dearth et al. Environ. Sci. Technol. 1991, 25, 245-254.
A. Jablonska et al. J. Chromatog. 1993, 647, 341-350.
H. C. Hollifield et al. J. Assoc. Off. Anal. Chem, 1978, 61, 537-544.
M. Oehme Int. J. Mass Spectrom., Ion Phys. 1983, 48, 287-290.
J.B. Pausch et al. Rubber Chem. Technol. 1983, 56, 1031-1044.
S.-Z Sha et al. J. Chromatog. 1984, 284, 157-165.
J. Milhaud Chem. Phys, Lett. 1985, 118, 167-173.
R. Kroneld Bull. Environ. Contam. Toxicol. 1985, 34, 486-496.
T. M. Trainor et al. Anal. Chem. 1987, 59, 601-610.
J.R. Donnelly et al. Biomed. Environ. Mass Spectrom. 1989, 18, 884-896.
B. Arbogast et al. Org. Mass Spectrom. 1990, 25, 191-196.
V. G. Voinov et al. J. Chromatog. 1991, 586, 360-362.
E. Kaisersberger et al. ACS Symp. Ser. 1994, 581, 74-80.
M. Oehme Fresenius J. Anal. Chem. 1994, 350, 544-554.
J. M. Curtis et al. Int. J. Mass Spectrom., Ion Processes 1997, 165-166, 625-639.
D. R. Zook, W. B. Knighton and E. P. Grimsrud, Dept. of Chemistry, Montana State University, Bozeman, MT, "Effect of Buffer Gas and Pressure Variations on the Formation of Br.sub.2.sup.- in Reactions of Thermal Electrons with Dibrominated Hydrocarbons and Flurocarbons", International Journal of Mass Spectrometry and Ion Processes, 104 (1991) 63-80, Elsevier Science Publishers B.V., Amsterdam.
A. Ito, K. Matsumoto and T. Takeuchi, Dept. of Synthetic Chemistry, Faculty of Engineering, Nagoya University, Nagoya, Japan, "Negative Ion Mass Spectra of Chlorine-Containing Molecules", Organic Mass Spectrometry, 1972, vol.6, pp 1045-1049, Heyden & Son Limited. Printed in Northern Ireland.
S. Daishima, Y. Iida and F. Kanda, Dept. of Industrial Chemistry, Faculty of Engineering, Seikei University, Kichijoji Kitamachi, Musashino, Tokyo, Japan, The Ion Formation and the Detection Limits in Negative Ion Chemical Ionization Mass Spectrometry of Some Halogenated Compounds, J. Trace and Microprobe Techniques, 7 (1&2), 87-102 (1989).
A. Danon and A. Amirav, School of Chemistry, Sackler Faculty of Exact Sciences, Tel Aviv University, Tel-Aviv, Israel, "Hyperthermal Surface Ionization: A Novel Ion Source with Analytical Applications", International Journal of Mass Spectrometry and Ion Processes, (1990), 96(2), pp. 139-167, Elsevier Science Publishers B.V., Amsterdam. Printed in The Netherlands.
AN: 57(1):D159 ANABSTR (Abstract).
AN: 1996:126010 HCAPLUS (Abstract).
AN: 82:58246 TOXLIT (Abstract).
AN: 85104602 MEDLINE (Abstract).
AN: 1988:621632 HCAPLUS (Abstract).
AN: 76:19012 TOXLINE (Abstract).
AN: 1990:111152 HCAPLUS (Abstract).
AN: 1987:445908 HCAPLUS (Abstract).
AN: 46(8):C9 ANABSTR (Abstract).
AN: 1971:481588 HCAPLUS (Abstract).
AN: 77165567 MEDLINE (Abstract).
AN: 85:63497 TOXLINE (Abstract).
AN: 87:69233 TOXLIT (Abstract).
AN: 1984:138436 HCAPLUS (Abstract).
AN: 78:50474 TOXLIT (Abstract).
AN: 85253051 MEDLINE (Abstract).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Detection and monitoring of toxic halogenated compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Detection and monitoring of toxic halogenated compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Detection and monitoring of toxic halogenated compounds will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1064127

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.