Detection and analysis of a fine foreign matter on a sample

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

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Details

356 72, B23K 2600, G01N 2100

Patent

active

060056606

ABSTRACT:
A foreign matter processing apparatus is disclosed for detecting a foreign matter sticking to the surface of a sample such as a circuit board. In the sample processing apparatus of the present invention, a fine foreign matter sticking to a surface of a sample is detected, and the composition of the detected foreign matter is analyzed. Then, it is determined based on a result of the analysis and various data registered in advance whether or not it is required to remove the foreign matter, and the foreign matter, whose removal has been determined to be required, is removed from the surface of the sample. Accordingly, detection, analysis and removal of a foreign matter on the surface of a sample can be performed by a single apparatus.

REFERENCES:
patent: 5023424 (1991-06-01), Vaught
patent: 5497007 (1996-03-01), Vritsky et al.
patent: 5865901 (1999-02-01), Yin et al.
"Study of Semiconductors 26," VLSI Technology 11 The Industrial Research Society of Japan, pp. 167-168.
Kiyoshi Takahashi, et al., "The Foundation of A Light-Excited Process," The Industrial Research Society of Japan, (1994), pp. 220-227.

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