Detecting erosion in collector optics with plasma sources in...

Details Detecting erosion in collector optics with plasma sources in... Detecting erosion in collector optics with plasma sources in...

2005-01-11

2005-01-11

Pert, Evan (Department: 2829)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C324S071200, C702S184000

Reexamination Certificate

active

06841322

ABSTRACT:
An embodiment of the present invention includes a technique to detect erosion in an extreme ultra violet (EUV) source collector system. An initial impedance and a coating impedance of a multi-layer (ML) coating of the collector in one of an extreme ultra violet lithography (EUVL) stepper and an optical system are obtained at first and second time instants. A relation between the coating and initial impedances is generated. An erosion rate of the ML coating is determined based on the relation.

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