Detachment and removal of microscopic surface contaminants using

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Including contaminant removal or mitigation

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438120, 438906, H01L 2148

Patent

active

059500719

ABSTRACT:
A process for detachment and removal of microscopic contaminant particles from a surface includes a pulsed detach light directed at the surface to excite a contaminant particle thereon at or near its resonant frequency, to thereby detach the particle from the surface; and a photophoresis light directed at the particle to move it by photophoresis, to thereby prevent its reattachment to the surface. A thermal gradient may also be applied to control the velocity and direction of particle movement by thermophoresis. Detach light is of variable pulse frequency and angle of incidence.

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