Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Direct contact with molten material
Patent
1975-04-14
1976-12-07
Thomas, Earl C.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Direct contact with molten material
423232, 48206, 48215, B01D 5334
Patent
active
039963357
ABSTRACT:
Sulfur compounds contained in fuel gases produced from the gasification of coal or petroleum residua are removed at above about 1600.degree.F temperature by contacting the gas with an absorbent material comprising a strong, macroporous particulate solid support containing molten metal carbonate, such as potassium carbonate, within its pores. Following such contacting and reaction of the sulfur compounds in the hot gas with the supported metal carbonate absorbent, it is regenerated by being contacted at high temperatures with steam and CO.sub.2 to remove the sulfur, which is recovered as H.sub.2 S. The metal carbonate absorbent material is reused by again contacting it with the hot fuel gas for sulfur removal, after which the sulfur-free fuel gas is burned in a combustion process such as a gas turbine to produce power.
REFERENCES:
patent: 1831731 (1931-11-01), Al
patent: 1899562 (1933-02-01), Dunn
patent: 3511595 (1970-05-01), Fuchs
patent: 3619130 (1971-11-01), Ventriglio et al.
patent: 3671185 (1972-06-01), Lefrancois et al.
patent: 3865924 (1975-02-01), Gidaspow et al.
patent: 3919390 (1975-11-01), Moore
Maruhnic Peter
Rovesti William C.
Wolk Ronald H.
Hydrocarbon Research Inc.
Thomas Earl C.
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