Destruction of volatile organic carbons

Hazardous or toxic waste destruction or containment – Containment – Solidification – vitrification – or cementation

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Details

2041573, 20415794, 20415821, A62D 300, B01D 5300, C07C 1700, C07B 6300

Patent

active

058667520

ABSTRACT:
A method for removing VOCs from a gas stream comprising irradiating the gas stream in intimate contact with a semiconductor catalyst under laminar flow conditions. The catalyst can be chosen from a wide range of semiconductor materials, including naturally occurring chalcopyrites, synthetic chalcopyrites, CdTe, CdS, CuInSe.sub.2, CuS, FeS.sub.2, CuFeS.sub.2, Si, GaAs, GaSb, GaPS, ZnS, GaInP, and As.sub.2 S.sub.3. This process can be performed in a fluidized bed, in a tube reactor or in an irradiated reactor packed with catalyst adhering to a light conducting fibrous substrate. The method is capable of being practiced in a passive manner in a module have no moving parts and no requirement for routine maintenance or replenishment of reagents.

REFERENCES:
patent: 4966665 (1990-10-01), Ibuski et al.
patent: 5045288 (1991-09-01), Raupp et al.

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