Designing method and device for phase shift mask

Details Designing method and device for phase shift mask Designing method and device for phase shift mask

2006-06-27

2006-06-27

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S323000

Reexamination Certificate

active

07067221

ABSTRACT:
The work load spent on designing a trench-type, Levenson-type phase shift mask is lightened and the working time for the designing process is shortened. A pattern11, having a plurality of apertures, is designed by means of a designing tool10. In a database30are prepared optimal functions that indicate optimal combinations of undercut amounts Uc and bias correction amounts δ according to each set of dimension conditions. An optimal function extraction tool20extracts optimal functions Fp and Fs that are matched with dimension conditions Mp and Ms on pattern 11, and determining tool40determines optimal values of the undercut amount Uc and the bias correction amount δ based on the extracted optimal function. A three-dimensional structure determining tool50determines a three-dimensional structural body13, having a depth d and the undercut amount Uc, for an aperture by which the phase of transmitted light is shifted by 180 degrees. Pattern correction tool60uses the bias correction amount δ to perform correction of the width of an aperture on pattern11and thereby provides a corrected pattern12.

REFERENCES:
patent: 6720114 (2004-04-01), Winder et al.
patent: 6780568 (2004-08-01), Nistler et al.
patent: 2003-177504 (2003-06-01), None
patent: JP02/12932 (2002-10-01), None

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