Design rule check method

Details Design rule check method Design rule check method

1997-09-18

2000-06-20

Teska, Kevin J.

39550006, G06F 1750

Patent

active

060787376

ABSTRACT:
A design rule check is to inspect whether mask pattern data of a semiconductor integrated circuit is correctly designed in accordance with a design standard or not. A design rule check method of the present invention is characterized in that design rule check errors occurring in the design rule check between a first error and a second error output in accordance with whether the design rule check errors overlap or not.

REFERENCES:
patent: 5225993 (1993-07-01), Iwatsuki et al.
patent: 5620916 (1997-04-01), Eden et al.
patent: 5706295 (1998-01-01), Suzuki
Bhat et al., "Special Purpose Architecture for Accelerating Bitmap DRC" 26th ACM/EEE Design Automation Conference pp. 674-677 (Jan. 1989).
Crawford et al., "Computer verification fo Large Scale Integrated Circuit Masks" IEEE pp. 132-135 (1978).
Modarres et al., "A Formal Approach to Desing-Rule Checking" IEEE Transactions on Computer-Aided Design pp. 561-573 (1987), vol. CAD-6, No. 4, Jul. 1987.
Hedenstierna et al. ("The halo algorithm--an algorithm for hierarchical design of rule checking of VLSI circuits", IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, vol. 12, No. 2, Feb. 1993, pp. 265-272.

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