Design and fabrication of inductors on a semiconductor...

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

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C336S200000

Reexamination Certificate

active

11638631

ABSTRACT:
The present invention is directed to an inductor fabricated above a substrate surface comprising a first set of inductors in a lower dielectric layer, a second set of inductors in an upper dielectric layer, and interconnects extending between the first and second sets of conductors to form a single continuous helical current path that turns around a central region. Since each turn of the inductor includes only one leg close to the substrate, the parasitic capacitance between the inductor and the substrate can be reduced and there is more free space in the upper and lower layers for increasing the width of the conductors and thereby reducing the series resistance of the inductor. Meanwhile, since the magnetic field generated by the inductor is substantially confined in a closed tube defined by its turns, there is less interference between the inductor and its neighboring components on the same and/or surrounding substrates.

REFERENCES:
patent: 3319207 (1967-05-01), Davis
patent: 3874075 (1975-04-01), Lohse
patent: 4724603 (1988-02-01), Blanpain et al.
patent: 6990729 (2006-01-01), Pleskach et al.

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