Design and fabrication method for finger n-type doped...

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Light responsive structure

Reexamination Certificate

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C257S186000, C257S187000, C257S192000, C257S292000, C257S461000, C438S149000, C438S154000, C438S161000, C438S433000, C438S481000, C438S484000, C438S491000

Reexamination Certificate

active

06881986

ABSTRACT:
A novel structure for a photodiode is disclosed. It is comprised of a p-type region, which can be a p-substrate or p-well, extending to the surface of a semiconductor substrate. A multiplicity of parallel finger-like n-wells is formed in the p-type region. The fingers are connected to a conductive region at one end.

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patent: 6194258 (2001-02-01), Wuu
patent: 6274918 (2001-08-01), Tsai et al.
patent: 6323985 (2001-11-01), Maloney

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