Desensitizing solution for lithography

Details Desensitizing solution for lithography Desensitizing solution for lithography

1997-02-19

1998-03-24

Bonner, Melissa

Compositions: coating or plastic

Coating or plastic compositions

Coating repellent

1014501, G03G 900

Patent

active

057307873

ABSTRACT:
A desensitizing solution for lithography is disclosed which contains at least one member selected from cyclic amine and ammonium compounds each containing specific structures. The desensitizing solution does not cause environmental pollution, is stable to long-term storage, continuous use, and fluctuations in environmental conditions, is effective in reducing the time required for etching treatment, and has excellent desensitization performance.

REFERENCES:
patent: 4579591 (1986-04-01), Suzuki et al.
patent: 4734132 (1988-03-01), Yoshida
patent: 4834797 (1989-05-01), Toyofuku et al.
patent: 4925761 (1990-05-01), Kulisz, Sr. et al.
patent: 4954173 (1990-09-01), Yoshida
patent: 5525458 (1996-06-01), Takizawa
patent: 5565290 (1996-10-01), Itakura et al.

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