Derivatives of hyaluronic acid, their preparation process...

Details Derivatives of hyaluronic acid, their preparation process... Derivatives of hyaluronic acid, their preparation process...

2006-11-16

2011-10-18

Maier, Leigh (Department: 1623)

Drug, bio-affecting and body treating compositions

Designated organic active ingredient containing

Carbohydrate doai

C536S055200, C623S004100

Reexamination Certificate

active

08039447

ABSTRACT:
The present invention relates to the use of a compound having the formula (I) wherein: n represents an integer varying from 720 to 6 200, and i varies from 1 to n, Rirepresents in particular OH, or a group of the formula (III) wherein k represents an integer varying from 1 to 17, and R′irepresents a linear or branched alkyl chain comprising p carbon atoms, wherein p is an integer varying from 1 to 17, with the proviso that k+p is not greater than 28, and preferably not greater than 20, and wherein at least one Rigroup represents a group of formula (III), for the preparation of a viscoelastic composition.

REFERENCES:
patent: 7767806 (2010-08-01), Hirakura et al.
patent: 2004/0234497 (2004-11-01), Luo et al.
patent: 0016818 (2000-03-01), None
patent: 0206373 (2002-01-01), None
patent: WO 2005/023906 (2005-03-01), None
Tian W M et al., “Hyaluronic acid hydrogel as Nogo-66 receptor antibody delivery system for the repairing of injured rat brain: in vitro”, Journal of Controlled Release, Elsevier, Amsterdam, NL, vol. 102, No. 1, Jan. 20, 2005, Abstract.
International search report in corresponding PCT/EP2006/010991, (2007).

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