Depth measurement apparatus and depth measurement method

Details Depth measurement apparatus and depth measurement method Depth measurement apparatus and depth measurement method

2008-07-17

2011-11-29

Dunn, Drew A (Department: 2857)

Data processing: measuring, calibrating, or testing

Measurement system

Dimensional determination

Reexamination Certificate

active

08069008

ABSTRACT:
A via hole depth measurement apparatus generates a light beam of white light, divides the light beam into a measurement and reference beams, focuses the measurement beam and projects it onto a sample, reflects the reference beam and advances it along the original optical path, continuously changes a relative optical path length difference between optical path lengths of the measurement and reference beams, combining reflected light from the sample and from the reflected reference beam and generates an interference beam, changes a relative distance between an objective lens which focuses the measurement beam and the sample, detects a relative position between the objective lens and the sample, receives the interference beam and outputs an interference signal, and, and outputs recessed portion depth information based on displacement information based on the interference signal and the relative position between the objective lens and the sample.

REFERENCES:
patent: 7403289 (2008-07-01), de Groot
patent: 2001-0066122 (2001-03-01), None

Affiliated with

Also associated with

Rating

Depth measurement apparatus and depth measurement method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Depth measurement apparatus and depth measurement method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Depth measurement apparatus and depth measurement method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4261475