Depositor for depositing a dielectric layer with fewer metallic

Details Depositor for depositing a dielectric layer with fewer metallic Depositor for depositing a dielectric layer with fewer metallic

1999-09-09

2000-12-05

Mills, Gregory

Coating apparatus

Gas or vapor deposition

438541, C23C 1600

Patent

active

061561223

ABSTRACT:
The present invention is characterized by setting a filter in the O.sub.3 -pipe of the depositor used to depositing a dielectric layer, wherein the filter is used to adsorb the metallic impurities in the O.sub.3 /O.sub.2 pipe. Therefore, the content of metallic impurities in the deposited dielectric layer can be efficiently reduced.

REFERENCES:
patent: 5014646 (1991-05-01), Ito et al.
patent: 5123376 (1992-06-01), Kaneko et al.
patent: 5928428 (1999-07-01), Horie
patent: 5935334 (1999-08-01), Fong et al.
patent: 5976471 (1999-11-01), Simandl et al.
patent: 5994209 (1999-11-01), Yieh et al.

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