Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2006-07-25
2010-10-19
Hassanzadeh, Parviz (Department: 1716)
Coating apparatus
Gas or vapor deposition
C156S345260
Reexamination Certificate
active
07815738
ABSTRACT:
The present invention provides, in one embodiment, a process for cleaning a deposition chamber (100). The process includes a step (100) of forming a reactive plasma cleaning zone by dissociating a gaseous fluorocompound introduced into a deposition chamber having an interior surface and in a presence of a plasma. The process (100) further includes a step (120) of ramping a flow rate of said gaseous fluorocompound to move the reactive plasma cleaning zone throughout the deposition chamber, thereby preventing a build-up of localized metal compound deposits on the interior surface. Other embodiments advantageously incorporate the process (100) into a system (200) for cleaning a deposition chamber (205) and a method of manufacturing semiconductor devices (300).
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Blanco Ignacio
Kruse Nathan
Zhao Jin
Brady III Wade J.
Chandra Satish
Hassanzadeh Parviz
Patti John J.
Telecky , Jr. Frederick J.
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