Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2006-01-04
2011-11-15
Hendricks, Keith (Department: 1724)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298080, C204S192130
Reexamination Certificate
active
08057648
ABSTRACT:
A deposition system and its method of control cancels the influence of noise occurring during measuring of a deposition rate using a noise canceller in order to exactly control the deposition rate, and obtains a film of a desired thickness. The deposition system includes a deposition device. A deposition rate sensor measures a deposition rate of the deposition device. A noise canceller cancels a noise component of the measured deposition rate. A power supply unit adjusts power supplied to the deposition device according to an output of the noise canceller.
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Berman Jason M
Bushnell , Esq. Robert E.
Hendricks Keith
Samsung Mobile Display Co., Ltd.
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