Deposition system and film thickness monitoring device thereof

Details Deposition system and film thickness monitoring device thereof Deposition system and film thickness monitoring device thereof

2008-01-22

2008-01-22

Le, Que Tan (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

With circuit for evaluating a web, strand, strip, or sheet

Reexamination Certificate

active

07321129

ABSTRACT:
A deposition system and film thickness monitoring device thereof. The film thickness monitoring device for monitoring thickness of a thin film coated on an optical substrate includes a laser light source, a retro-reflector, and a light receiver. The laser light source and the retro-reflector are disposed on opposite sides of the optical substrate. First, a light beam is emitted by the laser light source and then passes through the thin film along a first path. Second, the light beam is reflected by the retro-reflector and then passes through the thin film again along a second path parallel to the first path. Third, the light beam is received by the light receiver.

REFERENCES:
patent: 3871771 (1975-03-01), Scott
patent: 5568256 (1996-10-01), Korner et al.
patent: 2001/0011712 (2001-08-01), Castenmiller et al.
patent: 2003/0089690 (2003-05-01), Yamazaki et al.
patent: 2003/0193672 (2003-10-01), Okada et al.
patent: 2003/0197874 (2003-10-01), Moghaddam et al.

Affiliated with

Also associated with

Rating

Deposition system and film thickness monitoring device thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Deposition system and film thickness monitoring device thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deposition system and film thickness monitoring device thereof will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2805081