Thermal measuring and testing – Heat flux measurement
Reexamination Certificate
2006-07-18
2006-07-18
Verbitsky, Gail (Department: 2859)
Thermal measuring and testing
Heat flux measurement
C374S007000, C374S010000, C374S057000, C374S141000
Reexamination Certificate
active
07077563
ABSTRACT:
An apparatus and method for the monitoring and measurement of chemical and/or biological deposition in heat exchangers and other fluid processing vessels. The new and original sensing system includes at least two hollow fluid vessels conductively mounted across a constant heat transfer path. Thin film heat flux sensors are attached to a heat transfer surface of the vessels in order to measure changes in differential heat flux that occur when deposition begins to accumulate in the vessel. In this way, it is shown that differential heat flux measurements can be used to detect and measure the early onset of chemical and/or biological deposition.
REFERENCES:
patent: 3733887 (1973-05-01), Stanley et al.
patent: 3834873 (1974-09-01), Picker
patent: 4138878 (1979-02-01), Holmes et al.
patent: 4383438 (1983-05-01), Eaton
patent: 4408568 (1983-10-01), Wynnyckyj et al.
patent: 4571094 (1986-02-01), Wynnyckyj et al.
patent: 4577976 (1986-03-01), Hayashi et al.
patent: 4595297 (1986-06-01), Liu et al.
patent: 4607961 (1986-08-01), Wynnyckyj et al.
patent: 4722610 (1988-02-01), Levert et al.
patent: 4729667 (1988-03-01), Blangetti et al.
patent: 4779994 (1988-10-01), Diller et al.
patent: 4910999 (1990-03-01), Eaton
patent: RE33346 (1990-09-01), Knudsen et al.
patent: 5171518 (1992-12-01), Barshay et al.
patent: 5429178 (1995-07-01), Garey et al.
patent: 5590706 (1997-01-01), Tsou et al.
patent: 5855791 (1999-01-01), Hays et al.
patent: 6062069 (2000-05-01), Panchal et al.
patent: 6219573 (2001-04-01), Pompei
patent: 6238085 (2001-05-01), Higashi et al.
patent: 6241383 (2001-06-01), Feller et al.
patent: 6264362 (2001-07-01), Rolston
patent: 6390669 (2002-05-01), Nakamura et al.
patent: 6499876 (2002-12-01), Baginksi et al.
patent: 6508585 (2003-01-01), Nakamura et al.
patent: 6575662 (2003-06-01), French
patent: 2005/0105584 (2005-05-01), Ichikawa et al.
patent: 2006/0032606 (2006-02-01), Thybo et al.
patent: 197 21 810 (1998-12-01), None
patent: 0155 826 (1985-09-01), None
patent: 2 422 929 (1979-11-01), None
patent: 60228946 (1985-11-01), None
patent: WO 43762 (2000-07-01), None
Characklis, W.G., “A Rational Approach to Problems of Fouling Deposition,”Fouling of Heat Exchangers Surfaces, R.W. Bryers, ed., United Engineering Trustees, Inc., pp. 1-31, 1983.
Jones, A.D. et al., “The Use of a Heat Flux Sensors in Monitoring Fouling,” proceedings of conference held at Jesus College, Cambridge, edited by Fryer, Hasting, and Jeurnink, European Commission DGXII, Science, Research and Development, pp. 230-241, Mar. 23-25, 1994.
Lingfang, S. et al., “Development of a New Online Montoring Systems about Anti-fouling Efficiency of Cooling Water Treatment Technology,”Proceedings of the 4thWorld Congress on Intelligent Control and Automation, Shanghai, P.R. China, pp. 3179-3181, Jun. 10-14, 2002.
“Dats Side-Stream Fouling Monitor Systems,” Website Product Page, Bridger Scientific, Inc., Sandwich, MA, pp. 1-2, Sep. 29, 2003.
Boyette Scott M.
Little David A.
Xiao Caibin
General Electric Company
Verbitsky Gail
Wegman Hessler & Vanderburg
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