Coating processes – Coating by vapor – gas – or smoke
Reexamination Certificate
2011-04-19
2011-04-19
Meeks, Timothy H (Department: 1715)
Coating processes
Coating by vapor, gas, or smoke
Reexamination Certificate
active
07927658
ABSTRACT:
Disclosed herein is a process for producing a film, coating or powder employing a metallocene or metallocene-like precursor having the general formula CpMCp′, where M is a metal selected from the group consisting of Ru, Os and Fe; Cp is a first substituted cyclopentadienyl or cyclopentadienyl-like, e.g., indenyl, moiety that includes at least one substituent group D1, where D1is X; Ca1Hb1Xc1; Ca2Hb2Xc2(C═O)Ca1Hb1Xc1; Ca2Hb2Xc2OCa1Hb1Xc1; Ca2Hb2Xc2(C═O)OCa1Hb1Xc1; or Ca2Hb2Xc2O(C═O)Ca1Hb1Xc1; and Cp′ is a second substituted cyclopentadienyl or cyclopentadienyl-like, e.g., indenyl, moiety that includes at least one substituent group D1′, where D1′ is X; Ca1Hb1Xc1; Ca2Hb2Xc2(C═O)Ca1Hb1Xc1; Ca2Hb2Xc2OCa1Hb1Xc1; Ca2Hb2Xc2(C═O)OCa1Hb1Xc1; or Ca2Hb2Xc2O(C═O)Ca1Hb1Xc1. D1and D1′ are different from one another. X is a halogen atom or NO2; a1 is an integer between 1 to 8; b1 is an integer between 0 and 2(a1)+1−c1; c1 is an integer between 0 and 2(a1)+1−b1; b1+c1 is at least 1; a2 is an integer between 0 and 8; b2 is an integer between 0 and 2(a2)+1−c2; and c2 is an integer between 0 and 2(a2)+1−b2. The process can be used in manufacturing or processing electronic devices.
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Peck et al., “Chemical Vapor Deposition Of Novel Precursors For Advanced Capacitor Electrodes”,Electrochemical Society, Inc.published and presented on May 14, 2002.
Hoover Cynthia A.
Litwin Michael M.
Peck John D.
Thompson David M.
Burkhart Elizabeth
Dalal Nilay S.
Meeks Timothy H
Praxair Technology Inc.
Schwartz Iurie A.
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