Deposition processes

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Screen other than for cathode-ray tube

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430 4, 430 20, 430321, G03C 500, G03F 900

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active

051697378

ABSTRACT:
In a process for depositing a planarising material in spaces between a pattern of regions, such as dye stripes or dots, on a substrate, the planarising material is deposited as a layer over the pattern. The substrate is irradiated, from the reverse side, by a source of radiation, such as UV, to which the pattern material is opaque and to which the planarising material is responsive such that it is rendered insoluble to a particular solvent. The radiation acts on only those parts of the planarising material which are in the spaces. The remainder of the planarising layer is then removed by use of the solvent. Alternatively, or additionally, an ITO or other UV transparent layer may be formed over the pattern and a layer of resist formed thereover. The radiation then passes through the spaces and acts on only the resist areas over the spaces to render them soluble. Those areas and the ITO layer beneath them are then removed by etching, leaving ITO areas accurately aligned with the pattern. The process may be used in the manufacture of LC displays or semiconductor devices.

REFERENCES:
patent: 4812387 (1989-03-01), Suzuki et al.
patent: 4873175 (1989-10-01), Suzuki et al.
patent: 4948706 (1990-08-01), Sugihara et al.
Patent Abstracts of Japan, vol. 11, No. 178, p. 584, Jun. 9, 1987, 62-9301.
Patent Abstracts of Japan, vol. 11, No. 186, p. 586 Jun. 16, 1989, JP 62-14103.
Patent Abstracts of Japan, vol. 12, No. 427, p. 784, Nov. 11, 1988, JP 63-159808.
SID International Symposium, New Orleans, La., pp. 379-382, W. J. Lathan et al, "A new class of color filters for liquid crystal displays", May 14, 1987.

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