Deposition process in the vapour phase at low temperature of a c

Details Deposition process in the vapour phase at low temperature of a c Deposition process in the vapour phase at low temperature of a c

1990-02-14

1991-12-31

Silverman, Stanley

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

427249, 4272551, C23C 1634, C23C 1636

Patent

active

050770918

ABSTRACT:
The object of the invention is a one-step deposition process of a coating of the ceramic type based on nitrides or carbonitrides of at least one metallic element selected from Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf and Ta on a metallic or ceramic substrate, massive or obtained from fibres, by deposition in the vapor phase wherein a coating is deposited on the substrate by a chemical means at a pressure lower than 10 kPa at a temperature lower than 600.degree. C. and by using a system of precursors constituted simultaneously of:

REFERENCES:
patent: 4321073 (1982-03-01), Blair
patent: 4393097 (1983-07-01), Hirai et al.
patent: 4605566 (1986-08-01), Matsui et al.
Chemical Abstracts, vol. 74, No. 16, Apr. 19, p. 161, Abstract No. 78827x, Columbus, Ohio, U.S.A.; B. G. Gribov et al.
"Metallic Films Obtained by the Pyrolysis of Pi-Complexes of Chromium and Molybdenum in the Gas Phase" and Dokl. Akad. Nauk SSSR 1970, vol. 194, No. 3, pp. 580-582.

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