Deposition of silicon oxide coating on glass

Details Deposition of silicon oxide coating on glass Deposition of silicon oxide coating on glass

1998-05-20

2000-08-22

King, Roy V.

Coating processes

Electrical product produced

Transparent base

42725518, 42725537, 427314, 65 608, B05D 512, C23C 1640

Patent

active

061068926

ABSTRACT:
A method of depositing a silicon oxide coating on a hot glass substrate by chemical vapor deposition which comprises contacting the substrate with a silane and a phosphorus or boron ester, for example, triakylphosphite or trialkylborate, preferably triethylphosphite. Preferably, the method is performed during the formation of glass by the float glass production process.

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Rojas et al, J. Vac. Sci. Technol. B11 (6) Nov./Dec. 1993, pp. 2081-2089.
A.K. Hochberg and D. L. O'Meara, The LPCVD of Silicon Oxide Films Below 400 C From Liquid Sources, 1046 Journal of the Electropchemical Society 136 (1989) Jun., NR. 6, Manchester, NH, US, pp. 1843-1844.
The Deposition of Borophosphosilicate Glass Films By LPCVD Using 2,4, 6,8 Tetramethylcyclotetrasiloxane, O'Meara, Mat. Res. Soc. Symp. Proc., vol. 204, 204 (1991 no month data), pp. 533-538.

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