Deposition of materials

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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Details

118719, 118723, 118728, 118729, 427 86, 4272555, B05D 306

Patent

active

045768307

ABSTRACT:
In a method and apparatus for continuous plasma CVD deposition in and through a vacuum system, box carriers are provided to carry both the substrates and the plasma exciting electrodes through the system. Contamination of the system and cross doping of the applied coatings are reduced.

REFERENCES:
patent: 2930347 (1960-03-01), Bulloff
patent: 3787312 (1974-01-01), Wagner et al.
patent: 4047624 (1977-09-01), Dorenbos
patent: 4089735 (1978-05-01), Sussmann
patent: 4274936 (1981-06-01), Love

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