Deposition of germanium thin films on silicon dioxide employing

Details Deposition of germanium thin films on silicon dioxide employing Deposition of germanium thin films on silicon dioxide employing

1991-06-19

1993-10-05

Fourson, George

Fishing, trapping, and vermin destroying

148DIG59, 148DIG105, 437238, 437245, 437233, H01L 21441

Patent

active

052504522

ABSTRACT:
The invention is a method of depositing a layer of polycrystalline silicon on a silicon dioxide substrate until the layer of polycrystalline silicon is thick enough to support the deposition of germanium thereon, but while thin enough to substantially avoid the deleterious effects on the characteristics of semiconductor device structure that the deposition of polycrystalline silicon would otherwise potentially cause. The polycrystalline layer is then exposed to a germanium containing gas at a temperature below the temperature at which germanium will deposit on silicon dioxide alone while preventing native growth of silicon dioxide on the polycrystalline silicon layer, and for a time sufficient for a desired thickness of polycrystalline germanium to be deposited on the layer of polycrystalline silicon.

REFERENCES:
patent: 4357179 (1982-11-01), Adams et al.
patent: 5043294 (1991-08-01), Willer et al.
Dumin, D. J., "Selective Epitaxy Using Silane and Germane", Journal of Crystal Growth 8, pp. 33-36 (1971).
Ishii, H., et al, "Selective Ge deposition on Si using Thermal Decomposition of GeH.sub.4 ", Appl. Phys. Lett. 47 (8) pp. 863-865 (Oct. 15, 1985).
Wolf, S., et al., Silicon Processing for the VLSI Era, vol. 1:Process Technology, pp. 174-175, 177-179 (1986).

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