Deposition of diamond-like films by ECR microwave plasma

Details Deposition of diamond-like films by ECR microwave plasma Deposition of diamond-like films by ECR microwave plasma

1992-05-21

1995-06-27

King, Roy V.

Firearms

Breech loading

Grip magazine pistols

427575, 427571, 427598, 427249, 427122, 423446, 428408, B05D 306, C23C 1626

Patent

active

054278279

ABSTRACT:
Hard amorphous hydrogenated carbon, diamond-like films are deposited using an electron cyclotron resonance microwave plasma with a separate radio frequency power bias applied to a substrate stage. The electron cyclotron resonance microwave plasma yields low deposition pressure and creates ion species otherwise unavailable. A magnetic mirror configuration extracts special ion species from a plasma chamber. Different levels of the radio frequency power bias accelerate the ion species of the ECR plasma impinging on a substrate to form different diamond-like films. During the deposition process, a sample stage is maintained at an ambient temperature of less than 100.degree. C. No external heating is applied to the sample stage. The deposition process enables diamond-like films to be deposited on heat-sensitive substrates.

REFERENCES:
patent: H566 (1989-01-01), Nyaiesh et al.
patent: 4434188 (1984-02-01), Kamo et al.
patent: 4504519 (1985-03-01), Zelez
patent: 4859493 (1989-04-01), Lemelson
patent: 4869923 (1989-09-01), Yamazaki
patent: 4871581 (1989-10-01), Yamazaki
patent: 4915977 (1990-04-01), Okamoto et al.
patent: 4935303 (1990-06-01), Ikoma et al.
patent: 4939763 (1990-07-01), Pinnio et al.
patent: 4940015 (1990-07-01), Kobashi et al.
patent: 4952273 (1990-08-01), Popov
patent: 4996079 (1991-02-01), Itoh
patent: 5026415 (1991-06-01), Vasamoto et al.
patent: 5039548 (1991-08-01), Hirose et al.
Popov et al, "Electron cyclotron resonance plasma stream source for plasma enhanced chemical vapor deposition", J. Vac. Sci. Technol. A7(3) May/Jun. 1989, pp. 914-917.
Savvides, "Diamond Growth From The Vapor Phase", Ceramic Developments edited by C. C. Sorrell et al, Materials Science Forum vol. 34-36 (1988) pp. 487-495.
English language abstract of Japanese Patent No. 63-085092 to Araki et al. Apr. 15, 1988.
English language abstract of Japanese Patent No. 01-298165, Dec. 1, 1989.

Affiliated with

Also associated with

Rating

Deposition of diamond-like films by ECR microwave plasma does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Deposition of diamond-like films by ECR microwave plasma, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deposition of diamond-like films by ECR microwave plasma will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-285881