Deposition of diamond films

Details Deposition of diamond films Deposition of diamond films

1989-02-10

1990-08-14

Beck, Shrive

Coating processes

Electrical product produced

Welding electrode

423446, B05D 306, B01J 306

Patent

active

049486292

ABSTRACT:
Diamond films are deposited at substrates below temperatures of 400.degree. C. by chemical vapor deposition using a high powered pulsed laser and a vapor which is an aliphatic carboxylic acid or an aromatic carboxylic anhydride.

REFERENCES:
patent: 3961103 (1976-06-01), Aisenberg
patent: 4434188 (1984-02-01), Kamo et al.
patent: 4490229 (1984-12-01), Mirtich et al.
patent: 4604294 (1986-08-01), Tanaka et al.
patent: 4816286 (1989-03-01), Hirose
Matsumoto et al., Journal of Materials Science, V. 17, (1982) pp. 3106-3112.
Hirose et al., Jap. J. Appl. Phys., V. 25, pp. L519-L521.

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