Deposition of carbon- and transition metal-containing thin...

Details Deposition of carbon- and transition metal-containing thin... Deposition of carbon- and transition metal-containing thin...

2007-04-03

2007-04-03

Chen, Bret (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

C427S249180, C427S249190

Reexamination Certificate

active

10642426

ABSTRACT:
A process depositing a carbon- and transition metal-containing thin film on a substrate involves placing a substrate within a reaction space and sequentially pulsing into the reaction space a transition metal chemical and an organometallic chemical. Following each chemical pulse, the reaction space is purged, and the pulse and purge sequence is repeated until a desired film thickness is obtained. A preferred deposition process uses atomic layer deposition techniques and may result in an electrically conductive thin carbide film having uniform thickness over a large substrate area and excellent adhesion and step coverage properties.

REFERENCES:
patent: 4378987 (1983-04-01), Miller et al.
patent: 4422888 (1983-12-01), Stutius
patent: 5933760 (1999-08-01), Iyer et al.
patent: 6174809 (2001-01-01), Kang et al.
patent: 6482262 (2002-11-01), Elers et al.
patent: 6599572 (2003-07-01), Saanila et al.
patent: 6616986 (2003-09-01), Sherman
patent: 6699524 (2004-03-01), Kesala
patent: 6730164 (2004-05-01), Vaartstra et al.
patent: 6800552 (2004-10-01), Elers et al.
patent: 6951813 (2005-10-01), Derderian
patent: 6986914 (2006-01-01), Elers et al.
patent: 2002/0086504 (2002-07-01), Park et al.
patent: 2003/0022457 (2003-01-01), Gutsche et al.
patent: 2003/0031807 (2003-02-01), Elers et al.
patent: 2005/0037557 (2005-02-01), Doczy et al.
patent: WO 01/29280 (2001-04-01), None
Marika Juppo, “Atomic Layer Deposition of Metal and Transition Metal Nitride Thin Films and In Situ Mass Spectrometry Studies,” Univ. of Helsinki, Faculty of Science, Dept. of Chemistry, Laboratory of Inorganic Chemistry, Academic Dissertation, Dec. 14, 2001, 65 pages, Helsinki, Finland.
Peter Ettmayer & Walter Lengauer, “Nitrides: Transition Metal Solid State Chemistry,” Encyclopedia of Inorganic Chemistry, 1994 (R. Bruce King, ed.), pp. 2498-2515, vol. 5, John Wiley & Sons, West Sussex, England.
Peter Ettmayer & Walter Lengauer, “Carbides: Transition Metal Solid State Chemistry,” Encyclopedia of Inorganic Chemistry, 1994 (R. Bruce King, ed.), pp. 519-531, vol. 5, John Wiley & Sons, West Sussex. England.
T. Suntola and M. Simpson, “Atomic Layer Epitaxy,” 1990, pp. 18-21 and 38-39, Blackie and Son Ltd., Glasgow and London, England.
Toivo T. Kodas and Mark J. Hampden-Smith eds., The Chemistry of Metal CVD, 1994, pp. 60-63 and title pages, VCH, Weinheim, Germany.

Affiliated with

Also associated with

Rating

Deposition of carbon- and transition metal-containing thin... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Deposition of carbon- and transition metal-containing thin..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deposition of carbon- and transition metal-containing thin... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3764707