Deposition of borophosphosilicate glass

Details Deposition of borophosphosilicate glass Deposition of borophosphosilicate glass

1984-08-06

1985-10-08

Childs, Sadie L.

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

427 93, 427 95, 427255, C23C 1100, C23C 1300

Patent

active

045460167

ABSTRACT:
An improved method of depositing borophosphosilicate glass (BPSG) on a substrate is disclosed. The improved method uses temperatures substantially lower than conventional and a volume ratio of oxygen to the total hydride content in the deposition mixture substantially higher than conventional. A BPSG film of increased purity is produced at a rate of deposition substantially faster than conventional procedures.

REFERENCES:
patent: 3481781 (1969-12-01), Kern
patent: 4349584 (1982-09-01), Flatley et al.
patent: 4363830 (1982-12-01), Hsu et al.
patent: 4433008 (1984-02-01), Schnable et al.
Article-Chemically Vapor-Deposited Borophosphosilicate Glasses for Silicon Device Applications RCA Review, vol. 43, pp. 423-457.

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