Deposition monitor and control system

Details Deposition monitor and control system Deposition monitor and control system

1980-11-06

1983-05-03

McGraw, Vincent P.

Optics: measuring and testing

With plural diverse test or art

356320, 356407, 118712, G01N 2184, G01N 2131

Patent

active

043818943

ABSTRACT:
Method and apparatus for monitoring the deposition of a material or materials upon a substrate using atomic absorption techniques. Radiant energy is directed through a flow of evaporant during a deposition process. The radiation contains spectral emission lines absorbable by the evaporant as well as emission lines not absorbable by the evaporant. Changes in the transmission of one or more non-absorbable lines are used to compensate for changes in the absorption of absorbable lines of interest that are caused by misalignment or displacement of the optical elements during the deposition process.

REFERENCES:
patent: 3694086 (1972-09-01), May
patent: 3734620 (1973-05-01), Cade
patent: 3817622 (1974-06-01), Billman et al.
patent: 3895233 (1975-07-01), Boll et al.
patent: 4247205 (1981-01-01), Typpo
"A Dualwave-Length Atomic Absorption Spectrometer for the Determination of Lead in Blood." Dawson et al., 17th International Spectroscopy Colloquim, vol. 1, Florence Italy (Sep. 16-22, 1973) pp. 231-234.
"A High-Performance Dual-Wavelength Spectrophotometer and Fluorometer," Schmidt, J. of Biochemical and Biophysical Methods, 2(1980) 171-181.

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