Deposition method for nanostructure materials

Details Deposition method for nanostructure materials Deposition method for nanostructure materials

2003-07-10

2008-11-25

Phasge, Arun S (Department: 1795)

Chemistry: electrical and wave energy

Processes and products

Electrophoresis or electro-osmosis processes and electrolyte...

C204S491000

Reexamination Certificate

active

07455757

ABSTRACT:
A method for depositing a patterned coating of a nanostructure material onto a substrate includes: (1) forming a solution or suspension of containing the nanostructure material; (2) masking at least a portion of at least one surface of the substrate (3) immersing electrodes in the solution, the substrate upon which the nanostructure material is to be deposited acting as one of the electrodes or is electrically connected to at least one electrode; (4) applying a direct and/or alternating current electrical field between the two electrodes for a certain period of time thereby causing the nanostructure materials in the solution to migrate toward and attach themselves to the substrate electrode; and (5) subsequent optional processing.

REFERENCES:
patent: 3037923 (1962-06-01), Gnau
patent: 5296117 (1994-03-01), De Jaeger et al.
patent: 5906721 (1999-05-01), Bojkov et al.
patent: 6057637 (2000-05-01), Zettl et al.
patent: 6258237 (2001-07-01), Gal-Or et al.
patent: 6277318 (2001-08-01), Bower et al.
patent: 6280697 (2001-08-01), Zhou et al.
patent: 6333968 (2001-12-01), Whitlock et al.
patent: 6334939 (2002-01-01), Zhou et al.
patent: 6342755 (2002-01-01), Russ et al.
patent: 6401526 (2002-06-01), Dai et al.
patent: 6420293 (2002-07-01), Chang et al.
patent: 6422450 (2002-07-01), Zhou et al.
patent: 6456691 (2002-09-01), Takahashi et al.
patent: 6457350 (2002-10-01), Mitchell
patent: 6528785 (2003-03-01), Nakayama et al.
patent: 6553096 (2003-04-01), Zhou et al.
patent: 6616497 (2003-09-01), Choi et al.
patent: 6630772 (2003-10-01), Bower et al.
patent: 6652967 (2003-11-01), Yadav et al.
patent: 6787122 (2004-09-01), Zhou
patent: 6824755 (2004-11-01), Colbert et al.
patent: 6850595 (2005-02-01), Zhou et al.
patent: 6875329 (2005-04-01), Washizu et al.
patent: 6876724 (2005-04-01), Zhou et al.
patent: 6879143 (2005-04-01), Nagahara et al.
patent: 6980627 (2005-12-01), Qiu et al.
patent: 7014743 (2006-03-01), Zhou et al.
patent: 7252749 (2007-08-01), Zhou et al.
patent: 2002/0094064 (2002-07-01), Zhou et al.
patent: 2002/0140336 (2002-10-01), Stoner et al.
patent: 2002/0193040 (2002-12-01), Zhou
patent: 2003/0002627 (2003-01-01), Espinosa et al.
patent: 2003/0044519 (2003-03-01), Takai
patent: 2003/0094035 (2003-05-01), Mitchell
patent: 2003/0102222 (2003-06-01), Zhou et al.
patent: 2003/0111946 (2003-06-01), Talin et al.
patent: 2003/0180472 (2003-09-01), Zhou et al.
patent: 2003/0233871 (2003-12-01), Nguyen et al.
patent: 2004/0028183 (2004-02-01), Lu et al.
patent: 2004/0038251 (2004-02-01), Smalley et al.
patent: 2004/0055892 (2004-03-01), Oh et al.
patent: 2004/0108298 (2004-06-01), Gao
patent: 2004/0240616 (2004-12-01), Qiu et al.
patent: 2004/0256975 (2004-12-01), Gao et al.
patent: 2005/0133372 (2005-06-01), Zhou et al.
patent: 2005/0226361 (2005-10-01), Zhou et al.
patent: 2005/0269559 (2005-12-01), Zhou et al.
patent: 2005/0281379 (2005-12-01), Qiu et al.
patent: 2006/0008047 (2006-01-01), Zhou et al.
patent: 2006/0018432 (2006-01-01), Zhou et al.
patent: 1273215 (2000-11-01), None
patent: 0 989 579 (1999-09-01), None
patent: 0989579 (1999-09-01), None
patent: 2353138 (2001-02-01), None
patent: 08170193 (1996-07-01), None
patent: 10237362 (1998-09-01), None
patent: 2001110303 (2001-04-01), None
patent: 2001167692 (2001-06-01), None
patent: 2002301700 (2002-10-01), None
patent: 03075372 (2003-09-01), None
International Preliminary Report for PCT/US2004/020150 dated Apr. 6, 2006.
International Search Report for PCT/US04/20150 dated Mar. 10, 2006.
B. Gao et al., “Fabrication and Electron Field Emission Properties of Carbon Nanotube Films by Electrophoretic Deposition”,Advanced Materials, vol. 13, Issue 23, pp. 1770-1773, published online Nov. 23, 2001.
A. M. Affoune et al., “Electrophoretic Deposition of Nanosized Diamond Particles”,Langmuir, vol. 17, No. 2, 2001, pp. 547-551.
Bower, Chris et al., “Plamsa-induced alignment of carbon nanotubes”, Applied Physics Letters, vol. 77, No. 6, pp. 830-832; Aug. 7, 2000.
Journet, C. et al., “Large-scale production single-walled carbon nanotubes by electric-arc technique”, Nature, vol. 388, pp. 757-760; Aug. 1997.
Chinese Office Action for Chinese Patent Application No. 02827708.2 dated Jan. 12, 2007.
Zhengping et al., “Progress In Bulk-Optic-Material Current Sensors”,Lasers and optoelectronics progress 1999, vol. 36, 8, pp. 6-12.
Chinese Office Action for Chinese Patent Application No. 02827708.2 dated Sep. 7, 2007.
Korean Intellectual Property Office (KIPO) Office Action for Korean Patent Application No. 10-2006-7000476 dated Jun. 19, 2007.
Supplementary European Search Report dated Nov. 2, 2007 for European Patent Application 02807020.9.
Office Action from the Korean Intellectual Property Office for Korean Patent Application No. 10-2006-7000476 dated Feb. 19, 2008.
http://web.archive.org/web/20030507193839/http:snf.sanford.edu/Process/Lithography/liftoff.html, edited Aug. 14, 2000.
Third Office Action dated Aug. 1, 2008 from the Chinese Patent Office for Chinese Patent Application No. 02827708.2 (PCT/US02/37184).
First Office Action dated Aug. 10, 2008 from the Japanese Patent Office for Japanese Patent Application No. 2005-508477 (PCT/US03/38743).
Yang et al., “Magnetic Nanowire Based High Resolution Magnetic Force Microscope Probes”, Applied Physics Letter 87 (2005).
Hartmann, U., “Magnetic Force Microscopy”, Annu, Rev. Mater. Sci. 1999. 29: p. 53-87.
J.H. Hafner et al., “Structural and Functional Imaging with Carbon Nanotube AFM Probes”, Progress in Biophysics & Molecular Biology, 2001. 77: p. 73-110.
T. Larsen et al., “Comparison of Wear Characteristics of Etched-Silicon and Carbon Nanotube Atomic-Force Microscopy Probes”, Appl. Phys. Lett., 2002. 80(11): p. 1996-1998.
T. Arie et al., “Carbon-nanotube probe equipped magnetic force microscope”,J. Vac. Sci. Technol. B., 2002. 18: p. 104.
H. Cui et al., “Growth of Carbon Nanofibers on Tipless Cantilevers for High Resolution Topography and Magnetic Force Imaging”, Nano Letters, 2004. 4(11): p. 2157-2161.
H. Kuramochi et al., “A Magnetic Force Microscope Using CoFe-Coated Carbon Nanotube Probes”, Nanotechnology, 2005. 16: p. 24-27.
Z. Deng et al., “Metal-Coated Carbon Nanotube Tips for Magnetic Force Microscopy”, Applied Physics Letter, 2004. 85(25): p. 6263.
Jones, T.B., “Electromechanics of Particles”, 1995. Cambridge: Cambridge Univ. Press. pp. 34-49.
Jie Tang et al., “Rapid and Reproducible Fabrication of Carbon Nanotube AFM Probes by Dielectrophoresis”, Nano Letters, “in press”.
R. Stevens et al., “Improved fabrication approach for carbon nanotube probe devices”, Appl. Phys. Lett., vol. 77, No. 21, Nov. 20, 2000, pp. 3453-3455.
J. Hafner et al., “Growth of nanotubes for probe microscopy tips”, Nature, vol. 398, Apr. 29, 1999, pp. 761-762.
H. Dai et al., “Nanotubes as nanoprobes in scanning probe microscopy”. Nature, vol. 384, Nov. 14, 1996, pp. 147-150.
Office Action Restriction Requirement dated Aug. 8, 2003 for U.S. Appl. No. 09/996,695.
Office Action-non final action dated Dec. 1, 2003 for U.S. Appl. No. 09/996,695.
Office Action-final action dated May 26, 2004 for U.S. Appl. No. 09/996,695.
Office Action-non final action dated Feb. 17, 2005 for U.S. Appl. No. 09/996,695.
Notice of Allowance dated Apr. 3, 2007 for U.S. Appl. No. 09/996,695.
Office Action-non final action dated Mar. 28, 2008 for U.S. Appl. No. 10/842,357.
Office Action Restriction Requirement dated Jan. 4, 2005 for U.S. Appl. No. 10/730,068.
Office Action-non final action dated Apr. 21, 2005 for U.S. Appl. No. 10/730,068.
Notice of Allowance dated Oct. 12, 2005 for U.S. Appl. No. 10/730,068.
Office Action from Japanese Patent Office for Japanese Patent Application No. 2003-573718 dated Jun. 16, 2008.

Affiliated with

Also associated with

Rating

Deposition method for nanostructure materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Deposition method for nanostructure materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deposition method for nanostructure materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4023902