Deposition method and products

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Details

427248B, 427249, 427252, 427295, 427319, 428539, C23C 2900

Patent

active

041623452

ABSTRACT:
A method for producing a hard deposit on a substrate is described wherein a volatile halide of tungsten or molybdenum is reacted with a gas or gases containing hydrogen, oxygen and carbon to effect the deposition on a substrate of a compound of the metal in a liquid phase. The liquid phase deposited on the substrate is then reacted to remove oxygen and halogen and produce a hard deposit containing the metal and carbon. Also described are products which may be produced by the above method.

REFERENCES:
patent: 3574672 (1971-04-01), Tarver

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