Sugar – starch – and carbohydrates – Processes – Carbohydrate manufacture and refining
Patent
1989-08-01
1992-02-11
Nguyen, Nam X.
Sugar, starch, and carbohydrates
Processes
Carbohydrate manufacture and refining
118 501, 118720, 118723, 20419232, 20429831, B05D 306, C23C 1600
Patent
active
050874780
ABSTRACT:
A Penning type plasma discharge is formed in an inert gas between a cathode and anode. A carbon source such as graphite is heated to vaporization temperature, and vaporized carbon atoms caused to flow therefrom into the plasma where they are ionized. The inert gas supply is then removed, and the plasma discharge is sustained by the carbon vapor. A substrate is mounted adjacent to, and at the same electrical potential as, the cathode. With the potential of the plasma being maintained at approximately 70 to 100V relative to the substrate, carbon ions are attracted to and deposited on the substrate to form a diamond layer. The initial inert gas plasma discharge may be used to sputter-clean the surface of the substrate prior to diamond deposition. A dopant or other additive material may be injected into the carbon plasma, thereby enabling the fabrication of microelectric or other devices in the diamond layer. A material other than carbon may be vaporized for deposition using the same process as for diamond deposition. In addition, the process may be modified to provide a plasma source of pure ions, which may be extracted and utilized for a purpose other than deposition of a material layer.
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Denson-Low W. K.
Duraiswamy V. D.
Hughes Aircraft Company
Nguyen Nam X.
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