Deposition method and apparatus

Details Deposition method and apparatus Deposition method and apparatus

2005-11-04

2010-10-26

Cleveland, Michael (Department: 1712)

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

C118S726000

Reexamination Certificate

active

07819975

ABSTRACT:
A deposition method and apparatus provide a uniform deposition rate and good reproducibility in a process used to deposit a material onto a substrate. The deposition method includes preparing a substrate on which a thin film is deposited, preparing a line source that includes a plurality of heating crucibles are disposed in line, and rotating the line source while depositing the deposition material on the substrate.

REFERENCES:
patent: 4632059 (1986-12-01), Flatscher et al.
patent: 6509061 (2003-01-01), Ida et al.
patent: 6830626 (2004-12-01), Smith
patent: 2003/0168013 (2003-09-01), Freeman et al.
patent: 2004/0123804 (2004-07-01), Yamazaki et al.
patent: 1444423 (2003-09-01), None
patent: 11504077 (1999-04-01), None
patent: 11200017 (1999-07-01), None
patent: 2003-86374 (2003-03-01), None
patent: 2003297570 (2003-10-01), None
Chinese Office Action dated Feb. 6, 2009.
Chinese Certificate of Patent for Invention, Certificate No. 642366, date Jun. 16, 2010.

Affiliated with

Also associated with

Rating

Deposition method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Deposition method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deposition method and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4239763